IEEE NTC Technical Committee (TC9): Nano-Metrology and Characterization

Nanotechnology involves the development and processing of materials and systems at nanoscale. Thus accurate control of dimensions of objects is important in nanotechnology. Nanometrology, a subfield of metrology, concerns with science of measurements at nanoscale level. The main research in this filed is to develop or create new measurement techniques and standards to measure the physical parameters of nanomaterials and nanodevices such as length or size, force, mass, electrical, magnetic and other properties. Therefore, nanometrology plays a crucial role in producing nanomaterials and devices with a high degree of accuracy and reliability in nanomanufacturing. Some popular instrumental techniques can be used for measuring or determining the parameters for nanostructures and nanomaterials including X-Ray Diffraction, Transmission Electron Microscopy, High Resolution Transmission Electron Microscopy, Scanning Probe Microscopy, Scanning Electron Microscopy, Field Emission Scanning Electron Microscopy and etc. Nanocharacterization concerns the theoretical and practical aspects of using the nanometrological instruments to characterize the physical properties of nanomaterials, nanostructure, nanodevices, and nanosystems.

The main goal of this technical committee is to recruit worldwide researchers in the field of nano-metrology and characterization and encourage them actively participate the activities of IEEE NTC, thus to increase the impact of NTC sponsored conferences and to enhance the leadership of NTC in nanotechnology and to expand the global presence of NTC.

The current member of this technical committee includes:

TC Chairs:

Institution

Country

email

1. Guangyong Li

University of Pittsburgh

USA

gul6@pitt.edu

members

 

 

 

2.Mike Adel

KLA-Tencor

USA

mike.adel@kla-tencor.com

3.K. C. Fan

National Taiwan University

Taiwan

fan@ntu.edu.tw

4.Christofer Hierold

Swiss Federal Institute of Technology

Swiss

christofer.hierold@micro.mavt.ethz.ch

5.Steve Hummel

Nanometrics, Inc.

USA

shummel@nanometrics.com

6.Gerd Jager

Technical University Ilmenau

Germany

jaeger@mb.tu-ilmenau.de

7.Chih-Ming Ke

Taiwan Semiconductor Manufacturing Company

Taiwan

cmke@tsme.com

8.Yi-sha Ku

Center for Measurement Standards

Taiwan

yku@itri.org.tw

9.Cheol Jin Lee

Korea University

Korea

cjlee@korea.ac.kr

10.Jon Opsal

Therma-Wave, Inc.

USA

jopsal@thermawave.com

11.K. S. Peng

Center for Measurement Standards

Taiwan

Gwo-Sheng.Peng@itri.org.tw

12.W. C. Wang

National Tsing Hua University

Taiwan

wcwang@pme.nthu.edu.tw

13.Peng Li

National Cenetr for Nanoscience and Technology

China

lipeng@nanoctr.cn

14. Liming Liu

KLA-Tencor

China

liuliming.pitt@gmail.com

15. Lianqing Liu

Shenyang Institute of Automation

China

lqliu@sia.cn

16.Fanan Wei

Fuzhou University

Taiwan

weifanan@fzu.edu.c